Natalia Litchinitser in Chemical & Engineering News


Light that passes through the mask (shown on left) creates a smaller pattern on a substrate (right) thanks to a new hyperlens. Credit: Nano Lett

The article, "Hyperlens lights a new path to nanofabrication" highlights Professor Litchinitser's work in which a metamaterial lens beats diffraction limit and could bolster photolithography.

Photolithography has established itself as a standard in the semiconductor industry and as a stalwart in research labs by helping shrink electronics and other devices over decades.

But there are limits to how small the light-based technique can make things, and pushing those limits can be a pricey proposition, says Natalia M. Litchinitser.

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Published November 17, 2016